Fast-curing epoxy systems

ABSTRACT

The present invention relates to a low-alkylphenol composition comprising a) at least one epoxy resin, b) at least one amine having at least two secondary amino groups that are both part of an organic ring system, and c) at least one salt of a strong Brønsted acid with a counterion selected from metal ions, metal-containing ions, phosphonium ions and ammonium ions, to processes for production thereof and to the use thereof.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a 35 U.S.C. § 119 patent application which claims the benefit of European Application No. 18172950.0 filed May 17, 2018, which is incorporated herein by reference in its entirety.

FIELD

Epoxy resins, especially those that are prepared from bisphenol A and epichlorohydrin, are known raw materials for the production of high-quality casting resins, coating compositions, composites and adhesives. Aromatic epoxy resins cured with polyamines have not only good chemical and solvent resistance but also good bond strength on many substrates.

BACKGROUND

The curing of epoxy-amine coating systems can be accelerated using catalysts (U.S. Pat. No. 3,492,269 A, and 5,470,896 A, GB 1,105,772 A).

EP 0 083 813 A1, EP 2 957 584 A1, U.S. Pat. No. 5,441,000 A, and 5,629,380 A, WO 96/09352 A1 disclose the catalysed curing of epoxy resins with various amines.

Cyclic amines show advantages in epoxy curing. U.S. Pat. No. 8,951,619 B2 and 9,006,385 B2 disclose, inter alia, the catalyst-free curing of epoxy resins with N-substituted piperazines.

CN 106905816 A, CN 106833261 A, JP H08-113876 A, DE 1 954 701 A1, CA 2 165 585 A1 and U.S. Pat. No. 3,055,901 A disclose the catalyst-free curing of epoxy resins with aminoethylpiperazine.

EP 0 969 030 A1 discloses epoxy/amine coating systems wherein the amine component is an aliphatic amine. The compositions may include a catalyst. In the examples, aminoethylpiperazine is also used as hardener.

U.S. Pat. No. 4,775,734 A discloses the curing of epoxy resins with, inter alia, aminoethylpiperazine, bis(aminopropyl)piperazine or piperidine using catalytic amounts of tetrafluoroborate or hexafluorophosphate salts of various amines.

EP 3 255 078 A1 discloses epoxy resin compositions comprising at least one epoxy compound, 2-(2,2,6,6-tetramethylpiperidin-4-yl)propane-1,3-diamine, and optionally a catalyst which may be an inorganic salt inter alia.

WO 2017/074810 A1 discloses compositions comprising an epoxy resin, a polyetheramide and a further amine hardener which may be an imidazole or imidazoline inter alia, and a metal triflate catalyst.

US 2012/0010330 A1 discloses the curing of an epoxy resin with, inter alia, a cyclic diamine selected from piperazine and homopiperazine in the presence of at least 10% of an alkylphenol. The alkylphenols used have a reaction-accelerating effect among others, but significantly pollute the environment in the high concentrations used. The curing of the compositions disclosed can be effected in the presence of a further optional catalyst, which may be calcium nitrate.

A further common factor in the prior art compositions is that they cure too slowly or only at high temperatures.

For many applications, however, it is important that surface curing or complete through-curing proceeds particularly rapidly or else at low temperatures. Firstly, productivity can be increased or else the next processing step can be accelerated. The latter is important particularly in cold regions in order, for example, to provide ships or pipelines with a corrosion protection coating, such that continued operation is possible there in winter as well.

SUMMARY

The problem addressed in the present context is thus that of providing epoxy systems that react much more quickly under the same conditions than the formulations known to date. Another problem addressed was that of providing epoxy formulations that partly or fully cure more quickly than is possible to date at temperatures well below room temperature. In addition, epoxy formulations that pollute the environment to a lesser degree are to be provided.

DETAILED DESCRIPTION

These present problems are solved by the low-alkylphenol compositions according to the invention comprising

-   a) at least one epoxy resin, -   b) at least one cyclic amine having at least two secondary amino     groups that are both part of an organic ring system, and -   c) at least one salt of a strong Brønsted acid with a counterion     selected from metal ions, metal-containing ions, phosphonium ions     and ammonium ions.

The compositions according to the invention are low in alkylphenol, meaning that they contain not more than 10% by weight, preferably not more than 9% by weight, further preferably not more than 8% by weight, even further preferably not more than 7% by weight, most preferably not more than 5% by weight, based on the masses of all components, of alkylphenols. Most preferably, the low-phenol compositions do not contain any alkylphenols. Corresponding phenol-free compositions also have the advantage of low toxicity and allergenicity levels.

Component a) is at least one epoxy resin. All epoxy compounds are suitable in principle for this purpose.

Suitable epoxy compounds are described, for example, in EP 675 185 A2. Useful compounds are a multitude of the known compounds containing more than one epoxy group, preferably two epoxy groups, per molecule. These epoxy compounds may be either saturated or unsaturated and aliphatic, cycloaliphatic, aromatic or heterocyclic and may also have hydroxyl groups. They may additionally contain such substituents that do not cause any troublesome side reactions under the mixing or reaction conditions, for example alkyl or aryl substituents or ether moieties.

Preferred epoxy compounds here are glycidyl ethers which derive from polyhydric phenols, especially bisphenols and novolaks, and which have molar masses based on the number of epoxy groups ME (“epoxy equivalent weights”, “EV value”) between 100 and 1500 g/eq, but especially between 150 and 250 g/eq.

Particularly preferred epoxy compounds derive from resorcinol, hydroquinone, 2,2-bis(4-hydroxyphenyl)propane (bisphenol A), isomer mixtures of dihydroxydiphenylmethane (bisphenol F), 4,4′-dihydroxydiphenylcyclohexane, 4,4′-dihydroxy-3,3′-dimethyldiphenylpropane, 4,4′-dihydroxydiphenyl, 4,4′-dihydroxybenzophenone, bis(4-hydroxyphenyl)-1,1-ethane, bis(4-hydroxyphenyl)-1,1-isobutane, 2,2-bis(4-hydroxy-tert-butylphenyl)propane, bis(2-hydroxynaphthyl)methane, 1,5-dihydroxynaphthalene, tris(4-hydroxyphenyl)methane, bis(4-hydroxyphenyl) ether, bis(4-hydroxyphenyl) sulfone, and the chlorination and bromination products of the aforementioned compounds (for example tetrabromobisphenol A).

Very particular preference is given to using liquid diglycidyl ethers based on bisphenol A and bisphenol F having an epoxy equivalent weight of 150 to 200 g/eq.

It is also possible with preference to use polyglycidyl ethers of polyalcohols, for example ethane-1,2-diol diglycidyl ether, propane-1,2-diol diglycidyl ether, propane-1,3-diol diglycidyl ether, butanediol diglycidyl ether, pentanediol diglycidyl ether (including neopentyl glycol diglycidyl ether), hexanediol diglycidyl ether, diethylene glycol diglycidyl ether, dipropylene glycol diglycidyl ether, higher polyoxyalkylene glycol diglycidyl ethers, for example higher polyoxyethylene glycol diglycidyl ethers and polyoxypropylene glycol diglycidyl ethers, co-polyoxyethylene-propylene glycol diglycidyl ethers, polyoxytetramethylene glycol diglycidyl ethers, polyglycidyl ethers of glycerol, of hexane-1,2,6-triol, of trimethylolpropane, of trimethylolethane, of pentaerythritol or of sorbitol, polyglycidyl ethers of oxyalkylated polyols (for example of glycerol, trimethylolpropane, pentaerythritol, inter alia), diglycidyl ethers of cyclohexanedimethanol, of bis(4-hydroxycyclohexyl)methane and of 2,2-bis(4-hydroxycyclohexyl)propane, polyglycidyl ethers of castor oil, triglycidyl tris(2-hydroxyethyl)isocyanurate.

Further useful components A) include: poly(N-glycidyl) compounds obtainable by dehydrohalogenation of the reaction products of epichlorohydrin and amines such as aniline, n-butylamine, bis(4-aminophenyl)methane, m-xylylenediamine or bis(4-methylaminophenyl)methane. However, the poly(N-glycidyl) compounds also include triglycidyl isocyanurate, triglycidylurazole and oligomers thereof, N,N′-diglycidyl derivatives of cycloalkyleneureas and diglycidyl derivatives of hydantoins.

In addition, it is also possible with preference to use polyglycidyl esters of polycarboxylic acids which are obtained by the reaction of epichlorohydrin or similar epoxy compounds with an aliphatic, cycloaliphatic or aromatic polycarboxylic acid such as oxalic acid, succinic acid, adipic acid, glutaric acid, phthalic acid, terephthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, naphthalene-2,6-dicarboxylic acid and higher diglycidyl dicarboxylates, for example dimerized or trimerized linolenic acid. Examples are diglycidyl adipate, diglycidyl phthalate and diglycidyl hexahydrophthalate.

Also preferred are glycidyl esters of unsaturated carboxylic acids and epoxidized esters of unsaturated alcohols or unsaturated carboxylic acids. In addition to the polyglycidyl ethers, it is possible to use small amounts of monoepoxides, for example methyl glycidyl ether, butyl glycidyl ether, allyl glycidyl ether, ethylhexyl glycidyl ether, long-chain aliphatic glycidyl ethers, for example cetyl glycidyl ether and stearyl glycidyl ether, monoglycidyl ethers of a higher isomeric alcohol mixture, glycidyl ethers of a mixture of C12 to C13 alcohols, phenyl glycidyl ether, cresyl glycidyl ether, p-tert-butylphenyl glycidyl ether, p-octylphenyl glycidyl ether, p-phenylphenyl glycidyl ether, glycidyl ethers of an alkoxylated lauryl alcohol, and also monoepoxides such as epoxidized monounsaturated hydrocarbons (butylene oxide, cyclohexene oxide, styrene oxide), in proportions by mass of up to 30% by weight, preferably 10% to 20% by weight, based on the mass of the polyglycidyl ethers.

A detailed enumeration of the suitable epoxy compounds can be found in the handbook “Epoxidverbindungen und Epoxidharze” [Epoxy Compounds and Epoxy Resins] by A. M. Paquin, Springer Verlag, Berlin 1958, Chapter IV, and in Lee Neville “Handbook of Epoxy Resins”, 1967, Chapter 2.

Useful epoxy compounds preferably include glycidyl ethers and glycidyl esters, aliphatic epoxides, diglycidyl ethers based on bisphenol A and/or bisphenol F, and glycidyl methacrylates. Other examples of such epoxides are triglycidyl isocyanurate (TGIC, trade name: ARALDIT 810, Huntsman), mixtures of diglycidyl terephthalate and triglycidyl trimellitate (trade name: ARALDIT PT 910 and 912, Huntsman), glycidyl esters of Versatic acid (trade name: CARDURA E10, Shell), 3,4-epoxycyclohexylmethyl 3′,4′-epoxycyclohexanecarboxylate (ECC), ethylhexyl glycidyl ether, butyl glycidyl ether, pentaerythrityl tetraglycidyl ether (trade name: POLYPOX R 16, UPPC AG), and other Polypox products having free epoxy groups.

It is also possible to use mixtures of the epoxy compounds mentioned.

Particularly preferred epoxy resins are polyepoxides based on bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, 4,4′-methylenebis[N,N-bis(2,3-epoxypropyl)aniline], hexanediol diglycidyl ether, butanediol diglycidyl ether, trimethylolpropane triglycidyl ether, propane-1,2,3-triol triglycidyl ether, pentaerythritol tetraglycidyl ether and diglycidyl hexahydrophthalate.

Preference is given to using mixtures of the aforementioned epoxy compounds as component A).

Useful amines b) having at least two secondary amine groups that are both part of an organic ring system in principle include all compounds having at least two secondary cyclic amino groups. Furthermore, the amines b), as NH carrier, may also have further primary or acyclic secondary amino groups. Preferably, however, the amines used in the compositions according to the invention do not have any further primary or acyclic secondary amino groups, meaning that they have exclusively at least two secondary amino groups that are part of an organic ring system. In addition, however, the amines used in accordance with the invention may also have tertiary amino groups that are unreactive.

An “organic ring system” is understood to mean a heterocyclic system which may have one, two or at least three nitrogen-containing heterocycles (optionally fused to non-nitrogen-containing heterocycles or non-heterocycles). The organic ring system may also have heteroatoms other than nitrogen in the nitrogen-containing cycles, especially oxygen, sulfur and/or phosphorus. “A nitrogen-containing cycle” in the present context is understood to mean a simple nitrogen-containing cycle or a simple nitrogen-containing cycle that shares a ring bond with a non-nitrogen-containing heterocycle, a cycloalkane, a cycloalkene or an aromatic hydrocarbon (i.e. a nitrogen-containing cycle to which a non-nitrogen-containing heterocycle, a cycloalkane, a cycloalkene or an aromatic hydrocarbon is optionally fused).

The amines having at least two secondary amino groups may also be corresponding reaction products of compounds having secondary cyclic amino groups and optionally further primary or acyclic secondary amino groups with groups reactive toward NH groups, especially mono- and polyepoxides (adducts), polyisocyanates, polycarbodiimides, phenols (Mannich reactions with aldehydes and ketones), and substituted phenols (exchange of a Mannich base), polyesters, polycarboxylic acids, polyacrylates and polymethacrylates.

In a preferred embodiment, the amines b) are amines having at least two secondary cyclic amino groups, of which at least two belong to different cycles. More preferably, the amines b) are amines having two to four secondary cyclic amino groups on two to four different cycles. Corresponding amines having at least two different cycles are preferably also understood to mean fused heterocycles composed of at least two simple heterocycles.

Most preferably, the at least two secondary cyclic amino groups belong to the same cycle.

Even further preferred amines b) have the formula (I)

in which

-   -   R¹ to R⁴ is H or an organic radical and         X=—(Y ¹)_(m)-(A ¹)_(n)-(Y ²)_(o)-(A ²)_(p)-(Y ³)_(q)-(A         ³)_(r)-(Y ⁴)_(s),  (II)     -   where, independently of one another,         -   m, n, o, p, q, r and s=0 or 1,         -   A¹, A², A³=alkylene or alkenylene radical and         -   Y¹, Y², Y³, Y⁴=NR⁵, PR⁵, O or S, with R⁵ independently=H or             organic radical,         -   where any two organic radicals selected from R¹ to R⁵ and             any radicals present in the alkylene and/or alkenylene             radicals A¹, A², A³ may also form one or more further rings,     -   with the proviso that at least one of the radicals selected from         Y¹, Y², Y³, Y⁴ present is NR⁵ with R⁵=H.

The cyclic amines are saturated or partly unsaturated in relation to the ring shown in formula (I). Corresponding amines react more rapidly than the aromatic amines and imidazolines not covered by the formula. Further rings optionally present in the cyclic amine may be not only saturated or unsaturated, but also aromatic. Preferably, the further rings optionally present in the cyclic system are nonaromatic, i.e. saturated or unsaturated.

Preferred cyclic amines are saturated in relation to the ring shown in formula (I).

Preferably, at least one of the carbon atoms adjacent to the ring-bonded amino group=H, i.e. at least one of the R¹, R², R³ and R⁴ radicals=H. Further preferably, at least two of the R¹, R², R³ and R⁴ radicals=H. Preferably at least three and more preferably all of the R′, R², R³ and R⁴ radicals=H. Correspondingly unsubstituted amines react more rapidly than other amines. In the X radical, if present, A¹, A² and A³ are independently alkylene or alkenylene radicals. These may in turn bear organic radicals. If the alkylene and/or alkenylene radicals themselves have one or more organic radicals, any two organic radicals are selected from the organic radicals in the alkylene and/or alkenylene radicals may also form one or more further rings with one another or with any organic R¹ to R⁵ radicals present.

Radicals selected from R¹ to R⁵ present and any radicals present in the alkylene and/or alkenylene radicals A¹, A², A³ is substituted by at least one —NHR⁶ or —NH₂ group, where R⁶=organic radical. This means that, even in formula (I), as well as the at least two cyclic amino groups, there may also be further primary or acyclic secondary amino groups.

Preferably, A¹, A² and A³, if present, each independently have the formula (III)) —(CR ⁷ R ⁸)_(x)—(CR ⁹ ═CR ¹⁰)_(y)—(CR ¹¹ R ¹²)_(z)—  (III) in which, independently of one another,

-   -   R⁷, R⁸, R⁹, R¹⁰, R¹¹ and R¹²=H or organic radical and     -   1≤x+y+z≤7.

The indices x, y and z, in accordance with their pertinence to the A¹, A² and A³ radical, may preferably also be referred to as indices x¹, y¹ and z¹, as x², y² and z² and as x³, y³ and z³.

Preferably, X has a chain length of 2 to 15 atoms. Preferably, the sum total of all x, ½·y and z and of m, o, q and s has a value from 2 to 15, further preferably a value from 2 to 8, even further preferably a value from 2 to 5 and most preferably a value from 2 to 4. In other words, preferably, 2≤m+o+q+s+x¹±½·y¹+z¹+x²+½·y²+z²+x³+½·y³+z³≤15. Further preferably 2≤m+o+q+s+x¹+½·y¹+z¹+x²±½·y²+z²+x³+·½·y³+z³≤8, further preferably 2≤m+o+q+s+x¹+½·y¹+z¹+x²±½·y²+z²+x³+½·y³+z³≤5, most preferably 2≤m+o+q+s+x¹+½·y¹+z¹+x²+½·y²+z²+x³+½·y³+z³≤4.

The amines of the formula (I) are (optionally bi/poly)cyclic compounds since both carbon atoms adjacent to the amino group are attached on either side to the substituted (hetero)alkylene radical of the formula (II).

Further preferably, formula (I), as well as the nitrogen atom of the ring-attached NH group, has not more than one further heteroatom in the cycle, i.e. X preferably has the formula (IIa) X=—(CR ⁷ R ⁸)_(x)—(Y)_(o)—(CR ¹¹ R ¹²)_(z)—  (IIa) with

-   -   x and z=0, 1, 2, 3, 4, 5, 6 or 7,     -   o=1,     -   2≤x+o+z≤15     -   R⁷, R⁸, R¹¹, R¹²=H or organic radical and     -   Y=NH.

Most preferably, in formula (IIa), x=z=1.

Correspondingly, in that case, any two organic radicals in formula (I) selected from R¹ to R⁸, R¹¹ and R¹² may also form one or more further rings.

The R², R³, R⁴, R⁵, R⁶, R⁷, R⁸, R⁹, R¹⁰, R¹¹ and R¹² radicals may be organic radicals. Preferred organic radicals are alkyl, alkenyl, alkynyl, aryl or aralkyl radicals. These may be heteroatom-substituted within their chain and/or bear substituents. Preferred organic radicals are alkyl, alkenyl, alkynyl, aryl or aralkyl radicals which may bear one or more ether, carboxyl, amino, amido, urea, carbamate, carbonate, amidino or guanidino groups within the chain. In addition, preferred organic radicals may bear one or more substituents selected from organic radicals optionally having ether, carboxyl, amino, amido, urea, carbamate, carbonate, amidino or guanidino groups that may optionally also be substituted by hydroxyl, nitrile or halogen radicals or may themselves be hydroxyl, nitrile or halogen radicals.

Particularly preferred amines b) are selected from the group consisting of selected from the group consisting of 3,7-diazabicyclo[4.3.0]nonane, 2,8-diazabicyclo[4.3.0]nonane, 2-phenyl-2-imidazoline, 3,8-diazabicyclo[3.2.1]octane, 2,2′-bisimidazolidine, 1H-octahydroimidazo[4,5-c]pyridine, 1,4,8-triazaspiro[4.5]decane, 1,4-diazaspiro[4.5]decane, pyrazolidine, 2,2-dimethylimidazolidine, 1,4,7-triazacyclononane, decahydro-2,6-dimethylpyrazino[2,3-b]pyrazine, hexahydropyridazine, decahydro-4a,8a-dimethylpyrazino[2,3-b]pyrazine, 4,4′-methylenebis[piperidine], 2,2′-methylenebis[piperidine], tetradecahydro-4,7-phenanthroline, 2,2′-bipiperidine, 4,4′-bipiperidine, tetradecahydrophenazine, decahydroquinoxaline, 1,5-decahydronaphthyridine, octahydro-1H-cyclopentapyrazine, 2,2′-bipyrrolidine, piperazine, 2-methylpiperazine, 2,2-dimethylpiperazine, 2,3-dimethylpiperazine, 2-ethylpiperazine, 2,5-dimethylpiperazine, 2,6-dimethylpiperazine, 2,6-diazabicyclo[3.3.0]octane, 3,7-diazabicyclo[3.3.0]octane, 2,3,5,6-tetramethylpiperazine, 2,3,5-trimethylpiperazine, 2,2′-bipiperidine, 2-(2-piperidinyl)piperazine, 2,2′-bimorpholine, decahydro-2,6-naphthyridine, decahydro-2,7-naphthyridine, homopiperazine, 2-methylhomopiperazine, 6-methyl-1,4-diazepane, bis[2-(piperazin-1-yl)ethyl]amine and 1,2-dipiperazinoethane.

The compounds of the formula (I) may also be used in a mixture.

The compositions according to the invention further comprise at least one salt of a strong Brønsted acid with a counterion selected from metal ions, metal-containing ions, phosphonium ions and ammonium ions. Corresponding salts serve as catalyst. Such a strong acid in the present context is understood to mean a salt having a pKa (or in the case of polyprotic acids having a pKa of the first protolysis stage) of not more than 2. Preferably, the pKa of the corresponding acid is not more than −2. Preferably, the pKa of the strong acid is between 2 and −9.0, more preferably between −2 and −9.0.

The pKa is defined as the negative decadic logarithm of the equilibrium constant Ka and is considered to be a measure of the strength of an acid. The smaller a pKa, the stronger the acid. The pK_(A) is determined as disclosed in F. G. Bordwell, “Equilibrium Acidities in Dimethylsulfoxide Solution”, Acc. Chem. Res. 1988, 21, 456-463.

Preferred salts are the corresponding salts of the strong acids collated in the first column in Table 1 below:

TABLE 1 Literature reference, if not disclosed in Acid pK_(A) Bordwell Oxalic acid 1.5 Beyer Walter, Lehrbuch der organischen Chemie [Organic Chemistry], 21st edition, Hirzelverlag 1988, p. 324 p-Toluenesulfonic 0.7 Rompp Lexikon Chemie [Rompp's acid Chemical Lexicon], 10th edition, Georg Thieme Verlag, Stuttgart, New York, Verlag 1999, p. 4580-1. Trifluoroacetic acid 0.2 Beyer Walter, Lehrbuch der organischen Chemie, 21st edition, Hirzelverlag 1988, p. 272 Tetrafluoroboric acid −0.4 e-EROS Encyclopedia of Reagents for Organic Synthesis, Pages 1-4, Conference; General Review; Online Computer File, 2001 Nitric acid −1.4 Hollemann Wiberg, Lehrbuch der anorganischen Chemie [Inorganic Chemistry], 91st-100th edition, Walter de Gruyter Verlag, Berlin, New York, 1985, p. 603. Sulfuric acid −3 Rompp Lexikon Chemie, 9th edition, Georg Thieme Verlag, Stuttgart, New York 1991, p. 3459. Hydrochloric acid −8 Hydrobromic acid −9

The counterions of these strong acids are selected from metal ions, metal-containing ions, phosphonium ions and ammonium ions. Preferred metal ions are alkaline earth metal cations, especially beryllium, magnesium, calcium, strontium and barium ions, and lithium and zirconium ions.

Metal-containing ions are ions that contain at least one metal but are not pure metal ions. They are preferably metal compound ions, for example tetraphenylstibonium ions.

The counterions may also be ammonium ions (NH₄ ⁺) or optionally alkylated and/or arylated phosphonium ions. Very particular preference is given to ammonium ions.

Preferred salts of strong acids are calcium nitrate, magnesium bromide, zirconium(IV) chloride, indium chloride, bismuth chloride, copper tetrafluoroborate, calcium oxalate, lithium bromide and magnesium nitrate.

Preferred salts of strong acids are alkaline earth metal halides, including magnesium bromide in particular.

Preference is given to salts having good solubility in organic media (e.g. benzyl alcohol), i.e. salts having a solubility of at least 10 g/l in benzyl alcohol at 20° C. Salts such as calcium sulfate or barium sulfate are thus less preferred.

Preferably, the compositions according to the invention may further include d) amines that do not have at least two secondary amine groups as a constituent of an organic ring system, and/or c) further auxiliaries or additives.

Such amines d) are preferably di- or polyamines. These may be monomeric, oligomeric and/or polymeric compounds. Preferred monomeric and oligomeric compounds are selected from the group consisting of diamines, triamines and tetramines. The amine group of the di- or polyamines d) may be attached to a primary, secondary or tertiary carbon atom, preferably to a primary or secondary carbon atom. It is also possible to use mixtures of di- and/or polyamines as component d).

Components d) used may preferably be the following amines, alone or in mixtures:

-   -   aliphatic amines, especially the polyalkylenepolyamines,         preferably selected from ethylene-1,2-diamine,         propylene-1,2-diamine, propylene-1,3-diamine,         butylene-1,2-diamine, butylene-1,3-diamine,         butylene-1,4-diamine, 2-(ethylamino)ethylamine,         3-(methylamino)propylamine, diethylenetriamine,         triethylenetetramine, pentaethylenehexamine,         trimethylhexamethylenediamine,         2,2,4-trimethylhexamethylenediamine,         2,4,4-trimethylhexamethylenediamine, 2-methylpentanediamine,         hexamethylenediamine, N-(2-aminoethyl)ethane-1,2-diamine,         N-(3-aminopropyl)propane-1,3-diamine,         N,N″-1,2-ethanediylbis(1,3-propanediamine), dipropylenetriamine,         adipic dihydrazide and hydrazine;     -   oxyalkylenepolyamines, preferably selected from         polyoxypropylenediamine and polyoxypropylenetriamine (e.g.         Jeffamine® D-230, Jeffamine® D-400, Jeffamine® T-403, Jeffamine®         T-5000), 1,13-diamino-4,7,10-trioxatridecane,         4,7-dioxadecane-1,10-diamine;     -   cycloaliphatic amines, preferably selected from         isophoronediamine         (3,5,5-trimethyl-3-aminomethylcyclohexylamine),         4,4′-diaminodicyclohexylmethane, 2,4′-diaminodicyclohexylmethane         and 2,2′-diaminodicyclohexylmethane, alone or in mixtures of the         isomers, 3,3′-dimethyl-4,4′-diaminodicyclohexylmethane,         N-cyclohexyl-1,3-propanediamine, 1,2-diaminocyclohexane,         3-(cyclohexylamino)propylamine, TCD diamine         (3(4),8(9)-bis(aminomethyl)tricyclo[5.2.1.0²′⁶]decane),         4-methylcyclohexane-1,3-diamine,     -   amines having a cyclic amino group and at least one acyclic         primary or secondary amino group, preferably         1-(3-aminoethyl)piperazine (AEP), 1-(3-aminopropyl)piperazine;     -   araliphatic amines, preferably xylylenediamines;     -   aromatic amines, preferably phenylenediamines, especially         phenylene-1,3-diamine and phenylene-1,4-diamine, and         4,4′-diaminodiphenylmethane, 2,4′-diaminodiphenylmethane,         2,2′-diaminodiphenylmethane, optionally alone or in mixtures of         the isomers;     -   adduct hardeners, especially reaction products of epoxy         compounds, especially glycidyl ethers of bisphenol A and F, with         excess amine;     -   polyamidoamine hardeners, especially polyamidoamine hardeners         obtained by condensation of mono- and polycarboxylic acids with         polyamines, very especially by condensation of dimer fatty acids         with polyalkylenepolyamines;     -   Mannich base hardeners, especially Mannich base hardeners         obtained by reaction of mono- or polyhydric phenols with         aldehydes, especially formaldehyde, and polyamines; and     -   Mannich bases, especially based on phenol and/or resorcinol,         formaldehyde and m-xylylenediamine, and also         N-aminoethylpiperazine and blends of N-aminoethylpiperazine with         nonylphenol and/or benzyl alcohol, phenalkamines which are         obtained in a Mannich reaction from cardanols, aldehydes and         amines.

It is also possible to use mixtures of the aforementioned di- or polyamines as component d).

Preferred further auxiliaries and admixtures e) may be the compounds customary in epoxy chemistry. Preferred auxiliaries and admixtures e) are pigments, solvents, levelling agents, modifiers, for example benzyl alcohol or nonylphenol, degassing agents, flatting agents, reactive diluents, and conventional catalysts such as salicylic acid.

In a preferred embodiment, no amines d) are used. In a preferred embodiment, no further conventional catalysts are used, meaning that the possible auxiliaries and admixtures are limited to pigments, solvents, levelling agents, modifiers, degassing agents, flatting agents and reactive diluents.

The composition of components a) to e) in the composition according to the invention is preferably the following proportions by weight, based on the total mass of the composition:

-   a) epoxy resin 30-95% -   b) cyclic amine 1-50% -   c) salt of the strong Brønsted acid 0.001-5%, preferably 0.1-3%, -   d) further amine 0-48% and -   e) further auxiliaries or additives 0-48%.

Preferably, in addition, the proportion by weight of the amines b) based on the total mass of the amines b) and d) is at least 10% by weight, more preferably at least 30% by weight, even more preferably at least 50% by weight and more preferably still at least 70% by weight.

The invention further provides a process for producing a composition according to the invention, in which at least one epoxy resin a), at least one cyclic amine b) and at least one salt of a strong acid c) are mixed with one another.

The invention further provides for the use of the compositions according to the invention as a casting resin, coating composition, composite or adhesive or as a constituent thereof.

EXPERIMENTAL Example 1

To demonstrate the particular reactivity of the catalysts claimed, model experiments are first compared with one another. For this purpose, 0.025 mol (3.75 g) of 1,2-epoxy-3-phenoxypropane is added to a mixture of 22.68 g of toluene (solvent) and 2.08 g of tetradecane (internal standard). To this are added 0.025 mol (2.13 g) of piperidine, and 0.06 g of the particular catalyst. Immediately after the mixing, a GC is taken and the content of 1,2-epoxy-3-phenoxypropane is compared with the content of tetradecane. After 4 h at room temperature, by means of GC analysis, the residual content of 1,2-epoxy-3-phenoxypropane (EP) is ascertained (calibrated by the internal tetradecane standard). This gives the following results:

Comparison of the Catalysts

% EP in % EP after Catalyst the 0 sample 4 hours at RT  1* No catalyst 97 93  2* Dibutyltin dilaurate 99 93  3* Diazabicyclononane (DBN) 97 95  4* Diazabicycloundecane (DBU) 96 93  5* Diazabicyclooctane (DABCO) 94 93  6* Zinc acetylacetonate 94 90  7* Tetrabutylammonium 91 87 tribromide  8* Bismuth neodecanoate 91 88  9* Titanium tetrabutoxide 95 94 10* Salicylic acid 93 90 11* Phenol 97 85 12 Calcium nitrate 93 36 13 Magnesium bromide 91 28 14 Indium chloride 94 35 15 Bismuth chloride 94 43 16 Copper tetrafluoroborate 93 33 17 Calcium oxalate 94 38 18 Zirconium(IV) chloride 89 33 19 Lithium bromide 95 34 20 Magnesium nitrate 98 33 21 Calcium bromide 98 79 *Non-inventive comparative experiments

Example 2a)*

100 parts homopiperazine (Aldrich) are intimately mixed with 66 parts benzyl alcohol and 380 parts Epikote 828 (epoxy equivalent 190, Hexion) and a DSC is taken immediately thereafter.

Example 2b)

0.5 part calcium nitrate (50% in ethanol, Aldrich) is dissolved in 100 parts homopiperazine (Aldrich) and 66 parts benzyl alcohol and this mixture is intimately mixed with 380 parts Epikote 828 (epoxy equivalent 190, Hexion) and a DSC is taken immediately thereafter.

Example 2c)*

0.5 part calcium nitrate (50% in ethanol, Aldrich) is dissolved in 100 parts isophoronediamine (Evonik Industries) and 66 parts benzyl alcohol and this mixture is intimately mixed with 445 parts Epikote 828 (epoxy equivalent 190, Hexion) and a DSC is taken immediately thereafter.

Recipe No. 2a* 2b 2c* DSC analysis immediate Exothermic peak ° C. 70 65 90 Onset ° C. 32 28 50 Exothermic heat flow J/g 362 312 386 Tg max. ° C. 58 52 100 *Non-inventive comparative experiments

In the inventive experiment, the exothermic peak is lower, as is the onset of this exothermic peak. The reactive composition according to the invention is thus more reactive than without catalyst or without amines having two cyclic NH groups.

Example 3a)

0.5 part calcium nitrate (50% in ethanol, Aldrich) is dissolved in 100 parts isophoronediamine (Evonik Industries) and 88 parts benzyl alcohol and 5 parts piperazine and this mixture is intimately mixed with 467 parts Epikote 828 (epoxy equivalent 190, Hexion) and a DSC is taken immediately thereafter.

Example 3b)

0.5 part calcium nitrate (50% in ethanol, Aldrich) is dissolved in 100 parts isophoronediamine (Evonik Industries) and 88 parts benzyl alcohol and 20 parts piperazine and this mixture is intimately mixed with 534 parts Epikote 828 (epoxy equivalent 190, Hexion) and a DSC is taken immediately thereafter.

Results:

3a) 3b) Exothermic peak [° C.] 85 81 Onset [° C.] 48 38 Exothermic heat flow [J/g] 354 294 TG [° C.] 93 91

In experiment 3b), the exothermic peak is lower, as is the onset of this exothermic peak. The reactive composition 3b is thus more reactive than 3a. In 3a) the proportion of cyclic amines is less than 1% based on the overall formulation, and in 3b) more than 1%. 

The invention claimed is:
 1. A low-alkyl phenol composition comprising: a) an epoxy resin, b) a cyclic amine having at least two secondary cyclic amino groups belonging to the same cycle of the cyclic amine, c) a salt of a Brønsted acid, d) a diamine or polyamine, which is not a cyclic amine having at least two secondary cyclic amino groups belonging to the same cycle of the cyclic amine, and e) optional auxiliaries and/or additives; wherein a) is present in an amount of from 30 to 95 wt %, based on the total weight of the composition; wherein b) is present in an amount of from 1 to 50 wt %, based on the total weight of the composition, and is selected from the group consisting of 1H-octahydroimidazo[4,5-c]pyridine, 1,4,8-triazaspiro[4.5]decane, 1,4-diazaspiro[4.5]decane, pyrazolidine, 2,2-dimethylimidazolidine, 1,4,7-triazacyclononane, hexahydropyridazine, tetradecahydrophenazine, decahydroquinoxaline, octahydro-1H-cyclopentapyrazine, piperazine, 2-methylpiperazine, 2,2-dimethylpiperazine, 2,3-dimethylpiperazine, 2-ethylpiperazine, 2,5-dimethylpiperazine, 2,6-dimethylpiperazine, 2,3,5,6-tetramethylpiperazine, 2,3,5-trimethylpiperazine, 2-(2-piperidinyl)piperazine, homopiperazine, 2-methylhomopiperazine, and 6-methyl-1,4-diazepane; wherein c) is present in an amount of from 0.001 to 5 wt %, based on the total weight of the composition, the Brønsted acid of the salt has a pKa of from 2 to −9, and the counterion of the salt is selected from a metal ion, a metal-containing ion, a phosphonium ion, and a NH₄ ion; wherein d) is present in an amount such that b) accounts for at least 70 wt % of the combined weight of b) and d) in the composition; wherein e) are optionally present in an amount of up to 48 wt %, based on the total weight of the composition; and wherein alkylphenols are present in an amount of not more than 10% by weight, based on the total weight of the composition.
 2. The low-alkylphenol composition according to claim 1, wherein the epoxy resin a) is selected from the group consisting of bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, 4,4′-methylenebis[N,N-bis(2,3-epoxypropyl)aniline], hexanediol diglycidyl ether, butanediol diglycidyl ether, trimethylolpropane triglycidyl ether, propane-1,2,3-triol triglycidyl ether, pentaerythritol tetraglycidyl ether and diglycidyl hexahydrophthalate; and wherein alkylphenols are present in an amount of not more than 9% by weight, based on the total weight of the composition.
 3. The low-alkylphenol composition according to claim 2, wherein alkylphenols are present in an amount of not more than 7% by weight, based on the total weight of the composition.
 4. The low-alkylphenol composition according to claim 3, wherein alkylphenols are present in an amount of not more than 5% by weight, based on the total weight of the composition.
 5. The low-alkylphenol composition according to claim 1, wherein alkylphenols are present in an amount of not more than 8% by weight, based on the total weight of the composition.
 6. The low-alkylphenol composition according to claim 1, wherein the counterion of the salt of a Brønsted acid c) is selected from an alkaline earth metal ion, lithium ion, zirconium ion, phosphonium ion, and a NH₄ ion, and wherein alkylphenols are not present in the composition.
 7. The low-alkylphenol composition according to claim 1, wherein the Brønsted acid of the salt of a Brønsted acid c) is selected from oxalic acid, p-toluenesulfonic acid, trifluoroacetic acid, tetrafluoroboric acid, nitric acid, sulfuric acid, hydrochloric acid, and hydrobromic acid.
 8. The low-alkylphenol composition according to claim 1, wherein the optional auxiliaries and/or additives e) are present in an amount of up to 48 wt %, based on the total weight of the composition.
 9. The low-alkylphenol composition according to claim 8, wherein the diamine or the polyamine d) is selected from the group consisting of aliphatic diamines or polyamines, oxyalkylenepolyamines, cycloaliphatic diamines or polyamines, diamines or polyamines having a cyclic amino group and at least one acyclic primary or secondary amino group, araliphatic diamines or polyamines, aromatic diamines or polyamines, adduct hardeners of diamines or polyamines, polyamidoamine hardeners, Mannich base hardeners of diamines or polyamines, and Mannich bases of diamines or polyamines.
 10. A process for producing a low-alkyl phenol composition according to claim 1, wherein the a), b), c), d) and optionally e) are mixed with one another.
 11. A composite comprising the low-alkylphenol composition according to claim
 1. 12. A casting resin comprising the low-alkylphenol composition according to claim
 1. 13. A coating composition comprising the composition according to claim
 1. 14. An adhesive comprising the low-alkylphenol composition according to claim
 1. 